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dc.contributor.advisorNainggolan, Irwana
dc.contributor.authorIskandar, Rafika Ayu
dc.date.accessioned2025-01-23T04:22:48Z
dc.date.available2025-01-23T04:22:48Z
dc.date.issued2024
dc.identifier.urihttps://repositori.usu.ac.id/handle/123456789/100542
dc.description.abstractResearch has been done on the characteristics of sensors based on chitosan/Copper II Oxide (CuO) in detecting acetone concentrations using the amperometric method. The effect of copper II oxide addition on chitosan film sensors has been proven by improvement in the sensing properties of chitosan film sensors. Chitosan solution added with copper II oxide with variation 0,375grams, 0,75 grams, 1,5 grams, 2,25 grams, dan 3 grams. The concentration of 0,05 mg/L, 1,25 mg/L, 1,7 mg/L, 3,7 mg/L dan 5 mg/L The maximum voltage of Chitosan/CuO film sensor (0,172 V) is greater than chitosan sensor (0,098 V) for 0,05 mg/L acetone. Based on the sensing properties and SEM 0,01 grams copper II oxide are the best variation, where this Chitosan/CuO film sensor showed good sensitivity, reproducibility, selectivity, good response, long lifetime and smoother surface area. In the film characterization was performed using FTIR and the Detection Limit of the Chitosan/CuO Sensor was 0.75 grams in detecting acetone with the lowest concentration of 0.183 mg/L.en_US
dc.language.isoiden_US
dc.publisherUniversitas Sumatera Utaraen_US
dc.subjectElectrodepositionen_US
dc.subjectAcetoneen_US
dc.subjectCopper II Oxideen_US
dc.subjectChitosanen_US
dc.subjectSensoren_US
dc.titleKarakteristik Sensor Berbasis Kitosan/Tembaga II Oksida (CuO) dalam Mendeteksi Konsentrasi Aseton dengan Amperometrien_US
dc.title.alternativeCharacteristics of Chitosan/Copper II Oxide (CuO) Based Sensors in Detecting Acetone Concentrations Using Amperometricen_US
dc.typeThesisen_US
dc.identifier.nimNIM170802016
dc.identifier.nidnNIDN0013017908
dc.identifier.kodeprodiKODEPRODI47201#Kimia
dc.description.pages88 Pagesen_US
dc.description.typeSkripsi Sarjanaen_US
dc.subject.sdgsSDGs 9. Industry Innovation And Infrastructureen_US


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