Transformasi Kitosan dan Asam Palmitat Menjadi N-Palmitil Kitosan

Abstract

Many researchers interest to develope using of chitosan by performing chemical transformation reaction to produce chitosan derivatives. It has been conducted formation of N-palmityl chitosan from the reaction between palmityl chloride and chitosan. Palmityl chloride was produced by reaction between palmatic acid with phosphorpentachloride in chloroform at (60-70) oC for 3 hours. Palmityl chloride was reacted with chitosan in chloroform at 0 oC for 30 minutes, then it was hydrolyzed by using NaOH 1M at (60-65) oC for 20 hours. Formation of N-palmityl chitosan can be seen from FT-IR analysis, where absorptions at 2916 cm-1 (alkyl group, CH- stratching, CH3- assymetris), 2848 cm-1 (alkyl group, CH- stretching, -CH2- symetris), 720 cm-1 (-CH2- rocking in C-(CH2)n-C), 3448 cm-1 (amide, N-H stretching, R2NH secondary, and –OH stretching, dimer), 1543 cm-1 (amide-II, N-H deformation, secondary), 1573 cm-1 (amide-I, NH stretching, C=O stretching, secunder) and 1111 cm-1 (amide-III, CN stretching-NH deformation, secondary).

Banyak peneliti tertarik untuk mengembangkan kegunaan kitosan dengan melakukan reaksi transformasi kimia menjadi turunan kitosan. Telah dilakukan pembuatan N-palmitil kitosan dari reaksi antara palmitil klorida dengan kitosan. Palmitil klorida diperoleh melalui reaksi antara asam palmitat dengan phosforpentaklorida dalam pelarut kloroform pada suhu 60 – 70 oC selama 3 jam. Palmitil klorida direaksikan dengan kitosan dalam kloroform pada suhu O oC selama 30 menit, lalu dihidrolisis menggunakan NaOH 1 M pada suhu 60 – 65 oC selama 20 jam. Terbentuknya N-palmitil kitosan dapat dilihat dari hasil analisa FT-IR, dimana muncul serapan 2916 cm-1 (gugus alkil, CH- stratching; CH3- asymetris), 2848 cm-1 (gugus alkil, CH- stretching; -CH2- symetris), 720 cm-1 (-CH2- rocking in C-(CH2)n-C), 3448 cm-1 (amida, N-H stretching; NH sekunder, dan –OH stretching; dimer), 1543 cm-1(amida II, N-H deformasi; sekunder), 1573 cm-1 (amida I, N-H stretching; C=O stretching; sekunder) dan 1111 cm-1 (amida III, CN stretching-NH deformation, sekunder).