| dc.description.abstract | Background: Allergic contact dermatitis is an inflammatory skin mediated by T
cells caused by repeted skin exposure to hapten in sensitized individuals- Nitric
Oxide (NO) is one of the leading factors in pathogenesis of allergic contact
dermatitis -
Objective: To find out the correlation of NO levels in patients allergic contact
dermatitis serum with the positivity degree of patching test.
Methods and Subjects: The research is using analitical design cross sectional
which is implemented in January 2016 - April 2016, involving 36 patients with
allergic contact dermatitis to the subject of study is taken measurement of levels
of NO in serum. The result of the positivity degree of patching test in accordance
with the International contact Research Group (ICRD). The result were statistically
analized.
Results: In this study there is no significant correlation between the levels of NO
to the positivity degree of patching test of nickel (II) sulfate hexahydrate (r : -
0,106, p : 0,539), potassium dichromate (r : 0,31, p=0,859), N-Isopropyl-N-
phenyl-4-phenylenediamine (r : 0,093, p : 0,590), formaldehyde ( r = -0,49, p :
0,777), paraben mix (r : 0,245, p = 0, 150).
Conclutions : There is no correlation of NO levels in patients allergic contact
dermatitis serum with positivity degree of patching test. | en_US |
