Pengaruh Variasi Konsentrasi Hcl Terhadap Pemurnian Nanosilikon dari Pasir Kuarsa

Abstract

Synthesis of nanosilicon has been carried out magnesiothermically with the addition of NaCl salt and various concentrations of hydrochloric acid (HCl) in the nanosilicon purification step. Silica was extracted from natural sand measuring 200 mesh with the addition of 10 N NaOH and 6 N HCl and analyzed by FT-IR and XRD analysis. Ultrasonication of silica with NaCl salt was carried out with a mole ratio of 1 : 10. Then the resulting silica was reduced to silicon magnesiothermically with magnesium at 800°C for 6 hours with a mole ratio of SiO2 : Mg of 1 : 2. Nanosilicon purification was carried out by adding a mixture of deionized water and ethanol, HCl with various concentrations of 1N, 2N, 3N, 4N and 5N and 10% HF and then analyzed by XRD and SEM. The results of purification by XRD analysis on nanosilicon with 1N, 2N, 3N, 4N and 5N HCl purification in the second stage respectively were 9.4%, 32.3%, 16.1%, 74.9% and 94% with each particle size distribution is 0.570 nm – 3.694 nm; 1.284nm – 10.494nm; 5.591nm – 6.136nm; 7.064 nm – 16.646 nm and 7.169 nm – 15.572 nm. SEM analysis shows nanosilicon with agglomeration and less regular particle distribution.